Core values of PEC MEMS probes
With the recent growth of AI and HPC, the need for higher data rates is increasing to enable real-time
communication. To respond to these changes, wafer & package test environments are also being required to
meet >60GHz bandwidth to ensure high DUT yield of IO devices. MEMS buckling & micro-cantilever &
MEMS spring probe with short length and arbitrary probe shape can be designed to meet customer’s desire
specifications.
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Buckling probes
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Micro-cantilever probes
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MEMS spring pin
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Short probes have advantages in…
Wafer test with high speedWafer test with high frequencyFine pitch WLCSP/package test
• Reliable wafer-scale production possible
• Short length probes with various pitches
- 2.5mm length buckling probes for 90um pitch
- 1.0mm length MEMS spring for ≥150um pitch
• Customized design & adjustable force upon customer needs
In general, there is trade-off between the contact force of probe and the probe length, and the margin for the
trade-off becomes smaller as the probes decrease in size. However, the MMPM technology’s multi-beam
solution with micron-precision features allows decoupling of trade-off between probe length and contact force.
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Low force have advantages in…
Wafer test with high parallelismHybrid probing solution
• Adjustable contact force
through adjustment of multi-beam design
• Allow uniform contact force in probecard
in hybrid probing solution
• Lower force probe with high CCC
- 90*90um size of probe with 2.5gf, >2A CCC
The high temperature and chemical resistance of MMPM allows optimal electroplating conditions for each
metal properties. In addition, Au multi-layer is possible with MMPM MEMS technology, which is difficult to
applied in an electroplating environment where photoresists are used as molds
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Metal options have advantages in…
Test with high temperatureElectrical signal reliability test
• Au multi-layer electroplated probe
with high temperature stability and oxidation resistance
• Pd alloy with high durability and hardness
as maintaining optimal electroplating condition
• Simplify MEMS electroplating process
via max 120um thickness electroplating at once