 
 Core values of PEC MEMS probes
With the recent growth of AI and HPC, the need for higher data rates is increasing to enable real-time
						communication. To respond to these changes, wafer & package test environments are also being required to
						meet >60GHz bandwidth to ensure high DUT yield of IO devices. MEMS buckling & micro-cantilever &
						MEMS spring probe with short length and arbitrary probe shape can be designed to meet customer’s desire
						specifications.
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								Buckling probes    
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								Micro-cantilever probes    
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								MEMS spring pin    
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								Short probes have advantages in…Wafer test with high speedWafer test with high frequencyFine pitch WLCSP/package test
 • Reliable wafer-scale production possible 
 • Short length probes with various pitches - 2.5mm length buckling probes for 90um pitch - 1.0mm length MEMS spring for ≥150um pitch 
 • Customized design & adjustable force upon customer needs 
In general, there is trade-off between the contact force of probe and the probe length, and the margin for the
						trade-off becomes smaller as the probes decrease in size. However, the MMPM technology’s multi-beam
						solution with micron-precision features allows decoupling of trade-off between probe length and contact force.
						
					
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								Low force have advantages in…Wafer test with high parallelismHybrid probing solution
 • Adjustable contact force through adjustment of multi-beam design 
 • Allow uniform contact force in probecard in hybrid probing solution 
 • Lower force probe with high CCC - 90*90um size of probe with 2.5gf, >2A CCC 
The high temperature and chemical resistance of MMPM allows optimal electroplating conditions for each
						metal properties. In addition, Au multi-layer is possible with MMPM MEMS technology, which is difficult to
						applied in an electroplating environment where photoresists are used as molds
						
					
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								Metal options have advantages in…Test with high temperatureElectrical signal reliability test
 • Au multi-layer electroplated probe with high temperature stability and oxidation resistance 
 • Pd alloy with high durability and hardness as maintaining optimal electroplating condition 
 • Simplify MEMS electroplating process via max 120um thickness electroplating at once 
 
					 
									