point engineering

DESIGN RULES - MEMS buckling probe

The layout design rules for the MMPM MEMS process are explained in following tables. Following guidelines should be considered in design

Category Available Range Recommended Range
L Total length 1.5 ~ 6.0mm 2.5 ~ 4.0mm
W Width ≥ 5um 120*90um / 100*90um / 90*90um / 70*70um / 50*50um / 40*40um / 35*35um
H Height ≤ 120um
- Materials Pd alloy/Au or Cu
Ni alloy/Au or Cu
Pd-co/Au for better signal & high temp stability
- Options for
distal ends
Customized shape (Pointed, flat, etc) Rh plating on side, Au coating
- Options for
buckling beam
Insulation coating, Au coating
※ Tolerance of probe’s critical dimension could be managed within ±2um (±1.5um controllable)
Category Available Range Recommended Range
Minimum beam
line & space width
(for island or isolated pattern)
≥ 5um ≥ 8um
Minimum
line & space width
(for non-isolated pattern)
≥ 3um ≥ 5um

DESIGN RULES - MEMS Compression spring probe

The layout design rules for the MMPM MEMS process are explained in following tables. Following guidelines should be considered in design

Category Available Range Recommended Range
L Total length ≥ 0.5mm 1.0 ~ 2.0mm
W Width ≥ 90um ≥ 100um
H Height ≤ 120um 35~90um
- Materials Pd alloy/Au or Cu, Ni alloy/Au or Cu Ni alloy for cost competitiveness Pd-co/Au for better signal stability
- Additional options Customized shape (Pointed, flat, etc) Au coating (Whole, partial)
※ Tolerance of probe’s critical dimension could be managed within ±2um (±1.5um controllable)
Category Available Range Recommended Range
Miinimum spring line width ≥ 5um ≥ 8um
Minimum spring space width ≥ 5um ≥ 8um
Minimum outer barrier line width ≥ 5um ≥ 10μm (Prevent spring protrusion)
Minimum outer barrier space width ≥ 5um ≥ 8um

Expanding diversity in designs


Customized precision springs pins for wafer probing and fine-pitch socket application

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